Alkaline polishing Additive

Advantages: 

1. Superior surface morphology facilitates subsequent film deposition, enhances passivation effectiveness, improves long-wavelength absorption, and increases short-circuit current. 

2. Reduces alkali consumption and lowers the risk of metal ion contamination. 

3. Minimal surface residue and easily cleanable material broaden the cleaning window and decrease consumption of subsequent cleaning chemicals. 

4. Qihan’s proprietary selective etching accelerator enables easier cleaning, further reducing chemical consumption and minimizing wafer contamination.