Slow lift Additive

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Model:CA-10v03
Packaging Specification:10L/drum
Application:Used in Slow lift baths after Topcon/BC alkaline polishing for efficient dehydration, facilitating drying. Enhanced pre-dehydration reduces residual on wafer surfaces, improving cell yield and conversion efficiency.
Service Hotline
+86-(0)18961186739


Advantages: 

1 Optimizes surface tension and better dehydration; 

2 Lower residue on wafer surfaces; 

3 Reduces  watermarks  with EL and  contamination with PL; 

4 Consumption: 2 liters per ten thousand wafers.



Changzhou Qihang Energy Technology CO., Ltd.

Contact person: Ms. Wu
Telephone: +8618961186739
Address:602 Building 4 East side of Nanbei Street and North side of Market Road in Zouqu
Town,Zhonglou District, Changzhou City, Jiangsu Province, China. 
Email: lisawu@qihangenergy.com