Efficient Cleaning Performance | TOPCon Rework Wafer Cleaning Additive: Film removal rate >99%, chemical consumption reduced by 50%, yield rate 98.5%

In the TOPCon solar cell manufacturing process, rework wafer cleaning is a critical step for ensuring production yield and cost control. Abnormal film layers such as over-deposition, wrap-around, and scorching generated during the process, if not effectively removed, will directly lead to wafer scrappage and increased production costs. Our independently developed rework wafer cleaning additive has gained widespread market recognition for its superior cleaning performance and stable process behavior.

Market Validation – Full Adoption by Leading Customers

Since its market introduction, this product has achieved large-scale application. A leading battery manufacturer in Jiangsu Province has adopted our rework wafer cleaning additive across all its production lines. Multiple photovoltaic cell companies in Anhui, Sichuan, and other provinces are also using this product, with its market share consistently ranking among the industry's top tier. Sustained high-volume application has fully demonstrated the product's competitive advantages in performance, stability, and overall cost.

High-Efficiency Film Removal – One-Step Removal of Complex Abnormal Layers

Common abnormal film layers on TOPCon rework wafers include PECVD over-deposition, Poly-Si wrap-around, and high-temperature scorching layers. Conventional cleaning approaches often require extended process time or increased acid concentration, and when cleaning is incomplete, secondary rework is needed, further exacerbating yield loss.

Our rework wafer cleaning additive, formulated with high-efficiency penetrants and corrosion-inhibiting components, can rapidly penetrate and strip various complex film layers. The removal rate for stubborn abnormal layers such as over-deposition and scorching can reach over 99%. Even under low-temperature and low-concentration conditions, it maintains excellent cleaning performance. A single cleaning cycle restores wafer surface cleanliness, significantly reducing the secondary rework rate.

Lower Chemical Consumption – Significant Overall Cost Advantage

While ensuring cleaning effectiveness, this additive effectively reduces the consumption of primary chemicals. Actual application data shows:

1、HF consumption reduced by approximately 25%–50%, significantly decreasing the usage of high-cost chemicals.

2、Additive dosage reduced by approximately 20%–30% compared to conventional products.

3、Overall chemical cost savings exceeding 20%.

4、Lower chemical consumption also reduces wastewater treatment volume, delivering both cost savings and environmental benefits.

Higher Finished-Good Yield

The ultimate value of rework wafers is reflected in the finished cell yield. Production data from multiple customers shows that after adopting our rework wafer cleaning additive, the finished cell yield of rework wafers has been excellent, with some customers achieving over 98.5%, approaching the yield level of normal wafers. This strongly supports overall production line efficiency and cost control.

Less Crystallization – Significantly Extended Bath Lifespan

Crystallization is a common pain point in rework wafer cleaning baths. Crystal accumulation can lead to bath blockage, non-uniform cleaning, increased maintenance frequency, and downtime. Our additive, through an optimized surfactant system, effectively inhibits crystal precipitation. Some customers, after incorporating an HCL process, have achieved bath lifespans of 200 batches with no significant crystal accumulation at the tank bottom. This significantly extends the bath operating cycle, reduces the frequency of solution replacement and tank cleaning, and further lowers overall operating costs.

In the current era of increasing demand for cost reduction and efficiency improvement in TOPCon battery production, the high-efficiency rework wafer cleaning additive is helping customers achieve a win-win in both quality and cost through stronger film removal capability, lower chemical consumption, higher finished-good yield, and more stable bath lifespan.